干渉計

Interferometer

Abstract

(57)【要約】 【課題】干渉計の測定光学系のディストーションを高精 度に且つ簡便に測定することを目的とする。 【解決手段】本発明では、上記目的を達成するために、 被検面の面精度(設計幾何学形状を表わす関数式でフィ ッティングした後の残差形状)を測定するための干渉計 において、該被検面に既知の量だけ、該測定光学系の参 照面に対するアライメントずれを与え、該アライメント ずれを与える前後の干渉計測データの差分データにアラ イメント誤差補正を施す際に、該干渉計の測定光学系の ディストーションを校正し、得られた校正データにより 該面精度を補正する干渉計を用いる。
PROBLEM TO BE SOLVED: To measure the distortion of a measuring optical system with high accuracy by giving an alignment deviation from a reference surface to a test surface by an already known amount and correcting the alignment error of the differential data of interference measuring data obtained before and after the deviation is given by using the data obtained by calibrating the distortion of the optical system at the time of correcting the alignment error. SOLUTION: The planar wave 2 from an interferometer 1 is reflected by a Fizeau surface 3a formed on a Fizeau flat plate 3 and, at the same time, a measuring wavefront 4a which is obtained by transforming the planar wave 2 into a designed aspherical shape at the reference position of measurement by means of a null element 4 is also reflected by the test surface 5a of a specimen 5 set to the reference position and forms interference fringes in the interferometer 1 together with the planar wave 2 reflected from the Fizeau surface 3a. The interference fringes are detected by means of a detector and analyzed by means of an information processing system. The attitude of a tilt is monitored from the rear surface of the specimen 5 by means of an interference optical system and the shifting amount of the tilt is controlled by means of a shifting amount detecting means.

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