一种石墨烯透明电极薄膜的制备方法

Preparation method for graphene transparent electrode thin film

Abstract

The invention relates to a preparation method for a graphene transparent electrode thin film, in particular to a method for conducting sputtering deposition of a graphene thin film on the surfaces of different substrates by means of the double-cathode glow plasma discharge process with a redox graphite sheet serving as a target material element of graphene sputtering. According to the preparation method, in the graphene sputtering and film formation processes, as plasma of two cathodes act simultaneously, the system glow discharge film formation efficiency is improved; and accordingly, the graphene thin film is good in quality and stable in performance. The selection range of the material and shaped of the substrates is wide, thus, the graphene thin film can be prepared on the substrates of different shapes and materials, and the prepared graphene thin film is uniform and can be prepared in a large area and massive mode.
本发明涉及一种石墨烯透明电极薄膜的制备方法,以氧化还原石墨片为石墨烯溅射的靶材元素,借助双阴极辉光等离子放电作用在不同基体表面溅射沉积石墨烯薄膜的方法。本发明中石墨烯在溅射成膜过程中由于两个阴极的等离子同时产生作用,增强了体系的辉光放电成膜效率。因此,所得石墨烯薄膜质量较好,性能较为稳定。本发明对基体的材料及形状具有较大的选择性,可以在不同形状及不同材料的基体上制备石墨烯薄膜,所制备的石墨烯薄膜较为均匀,而且可以大面积量制备。

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