Composition for thinning technology pretreatment of TFT (thin film transistor) glass substrate

用于tft玻璃基板薄化工艺预处理的组合物

Abstract

用于TFT玻璃基板薄化工艺预处理的组合物,其特征在于所述组合物由以下组分组成:质量百分比含量10~20%的盐酸(HCl),质量百分比含量2%~5%的氢氟酸(HF),质量百分比含量5~10%的羧甲基纤维素钠(CMC‑Na),质量百分比含量2~3%的聚乙烯吡咯烷酮K90(PVP K90),质量百分含量10~20%的乙醇及余量的水。
A composition for thinning technology pretreatment of a TFT (thin film transistor) glass substrate is characterized by comprising the following ingredients by mass percentage: 10-20% of hydrochloric acid (HCl), 2-5% of hydrofluoric acid (HF), 5-10% of sodium carboxymethylcellulose (CMC-Na), 2-3% of polyvinylpyrrolidone K90 (PVP K90), 10-20% of alcohol, and the balance of water.

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